I don’t think it mentions the amount of energy required either, it mentions that there is less noise with the particle accelerator approach which looks to be the main advantage.
I figure the increased power getting to the etching process also helps increase throughput. I’m guessing that you only need a total amount of energy to do a unit of etching work, so with more power you can do more units of etching work per unit time.
That sounds plausible, and you could also likely sustain energy output easier with this setup which will help with the throughput as well. It seems like a big design constraint on ASML machines is that they wanted them to be portable so they could ship them to customers in different countries. Once you remove that constraint you get some benefits at the cost of the sheer size of the facility.
I don’t think it mentions the amount of energy required either, it mentions that there is less noise with the particle accelerator approach which looks to be the main advantage.
I figure the increased power getting to the etching process also helps increase throughput. I’m guessing that you only need a total amount of energy to do a unit of etching work, so with more power you can do more units of etching work per unit time.
That sounds plausible, and you could also likely sustain energy output easier with this setup which will help with the throughput as well. It seems like a big design constraint on ASML machines is that they wanted them to be portable so they could ship them to customers in different countries. Once you remove that constraint you get some benefits at the cost of the sheer size of the facility.